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- High-End Mask
Develop Process utilizes the difference in the solubility of the PR layer before and after the exposure to certain light sources (i.e. e-beam or laser). Due to the difference, patterns could be formed on the surface of blank masks. Two different solvent dispensing mechanisms are used in general, for example, (1) spin spray type using either fan nozzle or binary nozzle, or (2) puddle dispense.