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On Quartz substrate, Cr/CrO2 layer is formed by sputtering, followed by PR coating on top of it.
Using Laser lithography equipment, a certain pattern is written on the surface of the PR layer.
Using wet etching technique, the exposed Cr/CrO2 layer is etched to reveal the Quartz surface. The area covered by PR is unaffected.
CD measurement is performed over the Dark or Clear space patterns.