Capture Rate: The percentage rate at which a defect inspection tool can find defects of a given size, for example 99.5% of .25 micron defects (also called sensitivity)
CATS: Computer Aided Transcription Software is the primary fracturing and data viewing software used at all Photronics facilities. This software, developed by Transcription Enterprises, has the ability to simulate complete jobdeck (mask layout) schemes for the purposes of viewing the data prior to the manufacturing process. It is widely used by our customers for a variety of design checks.
CD: see Critical Dimension
CD Bias: The original and final CD values do not match, thus requiring process manipulation to achieve. see CD Process Push
CD Linearity: The degree to which a small feature deviates from its intended size as compared to a larger feature's deviation on the same mask.
CD Mean to Target: The difference between an average (mean) of a given set of CD readings from the actual targeted value.
CD Nominal: Customer provided specifications to monitor the size of the geometry within a pattern.
CD Process Push: The ability to move a CD value from its written dimension by manipulating the amount of develop time applied at the process stage.
CD Range: The difference between the lowest and highest CD values within a given set of readings.
CD Tolerance: A plus/minus value that dictates the allowable disparity between each actual CD reading and a target value. The target value may be either an absolute or mean number.
CD Uniformity: A specified )often plus/minus) value that dictates the allowable difference between the lowest and highest CD values within a given set of readings. It can apply to either a mean or absolute value.
Cell: A design element in a hierarchical database.
Cellulose Acetate Nitrocellulose: An organic material used as a pellicle membrane.
Centrality: The degree to which a mask pattern or pellicle is centered on a plate.
Character Rotation: Allows you to specify the degree that the characters of the mask title have to be rotated for the appropriate appearance.
Chip: see Die
Chip Check: see Die-to-Database Inspection
Chrome: The shiny metallic material that is used as a light blocker on most masks.
Chrome Extension: A chrome defect that extends from an intended chrome edge.
Chrome Spot: A chrome defect that is isolated from any other chrome.
CIF: An abbreviation for Caltech Intermediate Format, hierarchical pattern data format that is used for mask layout. This software is "public domain" meaning available for free without licensing fees.
Clamp Interference: The interference caused by placement of mask pattern data at or very near to the clamps on a MEBES substrate cassette or holder.
Classify: see Defect Types
Clear: An area on the mask where the chrome has been removed and there is only glass.
Clear Extension: A clear defect that extends into a chrome area from an intended clear feature.
Clear Field: The background area surrounding the component geometry is clear, that is, there is no chrome.
Code Layer: A layer or layers used to customize a base array of components. see Gate Array
Clock Start Date/Time: The date and time which Photronics Inc. receives all of the required data from the customer.
Closure Check: Internal patterns written onto every mask used to monitor the accuracy of the lithography equipment. Half of each pattern is written at the beginning of the write process and half is written at the end.
CMOS: Abbreviation for complementary metal oxide semiconductor, a common IC process.
C of C: Abbreviation for Certificate of Conformance, a quality document that list the inspections required, the pass fail criteria and the results for a specific mask.
Comp O: Comp O (ortho) controls the squareness of the patterns in the reticles.
Comp X: Comp X controls the height of the pattern along the X axis.
Comp Y: Comp Y controls the width of the pattern along the Y axis.
Compact: A container in which a photomask is stored. Compacts come in a wide variety of sizes and colors to accommodate different mask and pellicle sizes.
Compaction: A process by which a large data file containing highly repetitive structures can be reduced in file size.
Contamination: Particles, dirt or haze on a photomask.
Contract Date/Time: The date and time the finished product is quoted to be shipped to the customer. This is not a quoted receipt date of the product.
CORE: A lithography systems that use a laser to expose the resist on a photomask blank, stands for Customer Optical Reticle Engraver, various Core models include 2000, 2100, 2100XP, 2500, 2564.
Corner Rounding: The degree to which feature corners that should be at sharp angles are rounded by the lithography develop and etch processes.
Correlated Nominal: The correlation of the customer CD nominal with the difference between Photronics Inc. and the customer CD nominal calibration standards.
Correlation: The delta determined from a correlation exercise, most often refers to critical dimensions.
Correlation Exercise: A process by which the results from two different measurement tools are compared to each other based upon readings from a common artifact.
Cosmetic Grade: The tolerance for defect that may not affect the circuit geometry. These defects include scratches on the chrome outside of the array, damaged or partially removed AR, or glass chips on the edges of the reticle.
Critical Dimension: A geometry or space used as a gauge to monitor the pattern size and ensure that it is within the customer's specification: Abbreviated: CD
Cycletime: The cumulative time from receipt of an order to completion.